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Procurement of 4197-254BJLCGD001/17 Beijing Information Optoelectronic Chip Platform Construction Project(1) (Китайская Народная Республика - Тендер #69769880) | ||
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Страна: Китайская Народная Республика (другие тендеры и закупки Китайская Народная Республика) Номер конкурса: 69769880 Дата публикации: 07-01-2026 Источник тендера: www.chinabidding.com |
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Procurement of 4197-254BJLCGD001/17 Beijing Information Optoelectronic Chip Platform Construction Project(1)
| NO. | Product Name | Quantity | Main Technical Data | Remarks |
| 4197-254BJLCGD001/15 | Scribe Machine and Breaking Machine | 6 | Application and General Requirement: The system is mainly used for Chemical Concentration Management. This system is required to be reasonable in design, with advanced technology to ensure the system an excellent performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY1500 OR USD250 |
| 4197-254BJLCGD001/16 | Stepper photolithography machine | 1 | Application and General Requirement: The system is mainly used for Chemical Concentration Management. This system is required to be reasonable in design, with advanced technology to ensure the system an excellent performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY3000 OR USD500 |
| 4197-254BJLCGD001/17 | Electron Beam Lithography System | 1 | Application and General Requirement: The system is mainly used for Chemical Concentration Management. This system is required to be reasonable in design, with advanced technology to ensure the system an excellent performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY3000 OR USD500 |
| 4197-254BJLCGD001/18 | Focused Ion Beam-Scanning Electron Microscope | 1 | Application and General Requirement: The system is mainly used for Chemical Concentration Management. This system is required to be reasonable in design, with advanced technology to ensure the system an excellent performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY1500 OR USD250 |