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Procurement of 4197-244BEMC00001/06 Beijing Electronics Holding Semiconductor Manufacturing Co., Ltd 12-inch IC production line project(2) (Китайская Народная Республика - Тендер #59020447) | ||
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Страна: Китайская Народная Республика (другие тендеры и закупки Китайская Народная Республика) Номер конкурса: 59020447 Дата публикации: 15-11-2024 Источник тендера: www.chinabidding.com |
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Procurement of 4197-244BEMC00001/06 Beijing Electronics Holding Semiconductor Manufacturing Co., Ltd 12-inch IC production line project(2)
| NO. | Product Name | Quantity | Main Technical Data | Remarks |
| 4197-244BEMC00001/01 | Track | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/02 | Etch Equipment&Plasma Nitriding Equipment | 4&1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/03 | CVD | 4 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/04 | LP Furnace | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY5000/USD850 |
| 4197-244BEMC00001/05 | Laser Anneal | 2 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/06 | Ion Implanter | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY10000/USD1650 |
| 4197-244BEMC00001/07 | Clean Equipment1 | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY10000/USD1650 |
| 4197-244BEMC00001/08 | Clean Equipment2 | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY10000/USD1650 |
| 4197-244BEMC00001/09 | Particle Measurement&Defect Inspection | 2&1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/10 | Defect Inspection | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY20000/USD3250 |
| 4197-244BEMC00001/11 | Stress | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY5000/USD850 |
| 4197-244BEMC00001/12 | TEM | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY5000/USD850 |
| 4197-244BEMC00001/13 | E-Beam | 1 | Application and General Requirement This system is required to be reasonable in design, with advanced technology to ensure the system an excellent kinetic performance. The action elements selected for the control system shall be of high accuracy, good reliability and rapid response. The machine shall be convenient for use, operation and maintenance, be artistic in configuration, compact in structure, stable in performance and satisfactory in after-sale service. | CNY10000/USD1650 |